OpenMPL: An Open-Source Layout Decomposer

Multiple patterning lithography has been widely adopted in advanced technology nodes of VLSI manufacturing. As a key step the design flow, multiple layout decomposition (MPLD) is critical to closure. Due $\mathcal {N} \mathcal {P} $ -hardness general problem, various efficient algorithms have proposed with high-quality solutions. However, increasingly complicated flow and peripheral processing steps, developing decomposer becomes more difficult, slowing down further advancement this field. This article presents notation="LaTeX">$\mathsf {OpenMPL}$ (2020), an open-source framework, well-separated core solving steps. Besides, previous or techniques are inspected several issues discovered. We then propose corresponding new resolve these issues. The experiments demonstrate effectiveness our efficiency .